中微公司预计2025年净利润同比增长约28.74%至34.93%，刻蚀与薄膜设备驱动营收增长超36%

Core Viewpoint - Zhongwei Semiconductor Equipment (Shanghai) Co., Ltd. expects a revenue growth of over 36% to 12.385 billion RMB in 2025, driven by strong sales of etching and film equipment [1] Group 1: Financial Performance - The company anticipates a net profit attributable to shareholders of 2.08 billion to 2.18 billion RMB in 2025, representing a year-on-year increase of approximately 28.74% to 34.93% [1] - Core net profit, excluding non-recurring gains and losses, is projected to be between 1.5 billion and 1.6 billion RMB, with a growth range of 8.06% to 15.26% [1] - The company expects a significant increase in non-recurring gains, with equity investment income estimated at 611 million RMB, up from 198 million RMB the previous year [3] Group 2: Business Growth and R&D Investment - The company plans to invest 3.736 billion RMB in R&D for 2025, a 52.32% increase from the previous year, which is significantly higher than the average for companies listed on the Sci-Tech Innovation Board [2] - The core plasma etching equipment continues to gain recognition from domestic and international clients, with cumulative shipments of etching equipment expected to exceed 6,800 units by the end of 2025 [2] - The film equipment business is experiencing explosive growth, with LPCVD and ALD equipment revenue reaching approximately 506 million RMB, a staggering increase of 224.23% [1][2] Group 3: Supply Chain and Production Capacity - The company has expanded its production and R&D bases in Nanchang and Shanghai, covering approximately 140,000 and 180,000 square meters, respectively [3] - To ensure stable equipment delivery rates, the company is actively developing key component suppliers to enhance supply chain security [3] Group 4: Technological Advancements - The company has made significant progress in the development of CCP and ICP equipment, achieving single-atom level precision in processing [2] - In the compound semiconductor sector, the company maintains a leading position in GaN-based MOCVD equipment and is actively developing SiC applications [4]