安集科技：先进制程的发展对CMP抛光液的需求是由“步骤增加”与“技术迭代”共同驱动的复合型增长

Core Viewpoint - The development of advanced processes is driving a compound growth in the demand for CMP polishing liquids, influenced by both "increased steps" and "technological iterations" [1] Group 1: Demand Drivers - The advancement of logic chip processes leads to an increase in the number and density of multilayer wiring, while the evolution of storage chips towards 3D NAND significantly increases the number of stacking layers, resulting in more CMP process steps and higher consumption of polishing liquids [1] - The requirements for new polishing materials due to advanced processes and the manufacturing sector's demand for efficiency improvements are internal drivers for technological iterations and product upgrades, which continuously enhance the added value of the company's products [1] Group 2: Synergistic Results - The demand for CMP during the development of advanced processes is a result of the synergy between increased usage and value enhancement [1]