Sou Hu Cai Jing·2026-02-06 07:13Group 1 - Semiconductor Manufacturing International Corporation (SMIC) has applied for a patent titled "Mask Layout and Its Graphic Addition Method," with publication number CN121454857A, and the application date is July 2024 [1] - The patent describes a mask layout that includes effective graphics aligned with the optimal resolution direction and virtual graphics positioned in blank areas, allowing for improved resolution management during photolithography processes [1] - The method aims to maximize the allowable width of virtual graphics without imaging on the wafer, thereby enhancing the yield and reliability of mask layouts while minimizing the risk of collapse or detachment of virtual graphics [1] Group 2 - SMIC, established in 2000 and located in Shanghai, primarily engages in the manufacturing of computers, communications, and other electronic devices, with a registered capital of 244 million USD [2] - The company has made investments in four enterprises, participated in 129 bidding projects, and holds 150 trademark records along with 5,000 patent records, in addition to 446 administrative licenses [2]