科华微电子取得光刻胶及其应用专利

Group 1 - Beijing Kehua Microelectronics Materials Co., Ltd. and Shanghai Tongcheng Electronic Materials Co., Ltd. have obtained a patent titled "A Photoresist and Its Application," with authorization announcement number CN115793391B, applied for on November 2022 [1] - Beijing Kehua Microelectronics Materials Co., Ltd. was established in 2004, located in Beijing, primarily engaged in the manufacturing of chemical raw materials and chemical products, with a registered capital of 48.61419143 million RMB [1] - Shanghai Tongcheng Electronic Materials Co., Ltd. was established in 2020, located in Shanghai, primarily engaged in the manufacturing of computers, communications, and other electronic devices, with a registered capital of 100 million RMB [1] Group 2 - Tongcheng New Materials Group Co., Ltd. was established in 2008, located in Shanghai, primarily engaged in the manufacturing of chemical raw materials and chemical products, with a registered capital of 599.55455 million RMB [2] - Tongcheng New Materials Group Co., Ltd. has invested in 26 companies and participated in 2 bidding projects, holding 49 trademark records and 302 patent records, along with 13 administrative licenses [2]