EUV光刻机代码惊人：4500 万行，与 Win10相仿

Core Viewpoint - The article discusses the complexities and challenges associated with ASML's EUV lithography machines, particularly focusing on the software stack and development processes involved in their operation [2][4][7]. Group 1: Software Complexity - ASML's EUV machines come with approximately 45 million lines of code, comparable in size to Windows 10, indicating a significant complexity in their software stack [2]. - The software development lifecycle at ASML is described as very complex, with a master's thesis written on the engineering change process for EUV [7]. - The integration of software is primarily conducted on virtual hardware, as there are only two machines available for actual testing [4]. Group 2: Development Process - The initial error fixes and features for the software were communicated through a series of Word documents, highlighting a potentially outdated method of documentation [2][7]. - A large Jenkins farm compiles over 1500 Maven and Make modules, with complete EUV image builds taking overnight to run, while small changes still require over an hour to compile [4]. - The software workflow involves multiple layers of risk management before any code is written, indicating a thorough but potentially cumbersome process [7]. Group 3: Cultural Insights - Observations suggest that the development culture at ASML may involve a mix of experienced leaders and younger engineers, with a preference for open office plans and cloud storage for company IP [8]. - There is a belief that the software is primarily developed by hardware engineers, who may not be professional programmers, which could contribute to the current state of the software stack [8].