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重大突破!前ASML专家林楠推进中国EUV技术攻坚
是说芯语·2025-05-01 10:36

Core Viewpoint - The article highlights a significant breakthrough in the field of extreme ultraviolet (EUV) lithography technology achieved by a research team led by Lin Nan from the Shanghai Institute of Optics and Fine Mechanics, which marks a milestone for China's semiconductor industry and its ability to produce advanced chips below 7nm [2][18]. Summary by Sections Breakthrough in EUV Technology - Lin Nan's team developed a solid-state laser-driven laser plasma EUV (LPP-EUV) light source with an energy conversion efficiency of 3.42%, surpassing many international research levels and breaking Western monopolies in EUV core technology [2][8]. - This achievement signifies a critical step for China's semiconductor industry, allowing for the potential production of high-end chips independently [18][23]. Importance of EUV Technology - EUV lithography is essential for manufacturing advanced chips, enabling the miniaturization of circuit patterns to the nanoscale, which enhances performance and reduces power consumption [4][18]. - Historically, EUV technology has been dominated by ASML, the only company capable of producing commercial EUV lithography machines, which has restricted China's access to advanced manufacturing capabilities [4][6]. Comparison of Technologies - ASML's EUV machines utilize a laser-driven liquid tin target technology with a low efficiency of 0.02%, while Lin Nan's team has innovated by using solid-state pulsed lasers, achieving a higher efficiency and smaller size [6][11]. - The solid-state laser technology has the potential for further efficiency improvements, with theoretical maximum efficiency projected to reach 6% [11][12]. Impact on the Semiconductor Industry - The breakthrough is expected to boost confidence in China's semiconductor sector, allowing domestic manufacturers to reduce reliance on foreign equipment and lower production costs [18][19]. - It will also stimulate the entire semiconductor supply chain, encouraging advancements in materials, chip design, and manufacturing processes, ultimately fostering innovation in emerging industries like 5G and artificial intelligence [18][19]. Challenges Ahead - Despite the significant progress, challenges remain in establishing a complete EUV ecosystem, as China still relies on imports for critical components such as optical elements, photoresists, and alignment systems [19][20][21]. - Ongoing research and development efforts are crucial to bridge the gap with international standards and achieve self-sufficiency in EUV technology [22][23].