天璇新材料 总经理 周宓确认演讲 | 2025势银（第五届）光刻产业大会（PRIC 2025）

Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [14][23][24]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, in Hefei, Anhui, organized by TrendBank, with a focus on cutting-edge lithography technologies such as EUV, electron beam lithography, and nanoimprint [14][18][24]. - The agenda includes discussions on the current state of photolithography materials, including photoresists and wet electronic chemicals, and their domestic production challenges [14][22][23]. - The event will feature over 20 industry experts presenting on various topics, providing a platform for interaction across the lithography supply chain [15][18]. Group 2: Key Speakers and Topics - Zhou Mi, General Manager of Ningbo Tianxuan New Materials, will present on the development and progress of nanoimprint optical resins [4][11][14]. - Other notable speakers include experts from institutions like Fudan University and Nankai University, discussing topics such as heterogeneous integration and advanced packaging challenges [11][12][14]. Group 3: Industry Challenges - The domestic photolithography industry faces significant challenges, including low self-sufficiency rates in high-end photoresists and reliance on imports for critical materials and equipment [22][23]. - The high precision required for mask manufacturing and the dominance of foreign companies in high-end lithography machines, such as EUV lithography, are major bottlenecks for the industry [22][23]. Group 4: Strategic Importance - Strengthening the self-sufficiency of lithography technology and related industries is crucial for ensuring supply chain security in the semiconductor sector amid increasing geopolitical tensions [23][24]. - The conference aims to foster collaboration between academia, research institutions, and industry to accelerate technological innovation and enhance the overall competitiveness of the lithography sector [23].