Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities in the semiconductor industry [22][23]. Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui, with an expected attendance of 300 participants [18][22]. - The event will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, wet electronic chemicals, and mask manufacturing [15][18]. Key Topics of Discussion - The conference will explore cutting-edge lithography technologies such as extreme ultraviolet (EUV), electron beam lithography, and nanoimprint lithography, along with the current state and technological bottlenecks of domestic photoresists and wet electronic chemicals [14][22]. - Discussions will also focus on the challenges faced in the localization of lithography equipment, including the development, manufacturing processes, and market conditions [14][22]. Industry Challenges - The domestic high-end photoresist supply rate is low, and there is a significant gap in research and production technology compared to international standards, affecting the quality and performance required for advanced chip manufacturing [22][23]. - The supply of high-purity and specialty wet electronic chemicals is heavily reliant on imports, posing risks to the supply chain [22][23]. Conference Highlights - The event will include academic discussions aimed at establishing a theoretical foundation for industry development, fostering deep integration of production, learning, and research [16][18]. - A roundtable forum will be held to facilitate interaction and resource integration among upstream and downstream enterprises in the lithography supply chain [17][18]. Keynote Speakers - Notable speakers include Ma Hao, a senior liquid chromatography engineer from Agilent Technologies, who will present on new trends in IC photoresist characterization [10][11].
安捷伦科技 资深液质工程师 马浩确认演讲 |(第五届)光刻产业大会(PRIC 2025)