Tianjin Jiuri New Materials (SH:688199) 势银芯链·2025-07-03 09:01Core Viewpoint - The 2025 TrendBank Lithography Industry Conference aims to address the challenges and advancements in lithography technology, materials, and equipment, focusing on enhancing domestic capabilities and self-sufficiency in the semiconductor industry [42][41]. Group 1: Conference Overview - The conference will take place on July 9-10, 2025, at the Sheraton Hotel in Hefei, Anhui [36]. - It will feature over 20 speakers from the lithography industry, covering advanced lithography technologies, photoresists, and wet electronic chemicals [33]. - The event aims to foster collaboration between academia, research institutions, and industry to accelerate technological innovation and enhance the competitiveness of the lithography sector [41][32]. Group 2: Key Topics and Challenges - The conference will discuss the current state and technological bottlenecks of domestic photoresists and wet electronic chemicals, emphasizing the need for innovation to improve self-sufficiency [32][40]. - Challenges in the lithography industry include low domestic self-sufficiency rates for high-end photoresists, reliance on imports for certain high-purity chemicals, and difficulties in the precision manufacturing of masks [40][41]. - The event will also explore the critical issues surrounding the localization of lithography equipment, particularly the high-end EUV lithography machines, which are currently dominated by foreign manufacturers [40][41]. Group 3: Featured Speakers and Sessions - Tang Hongying, head of the Semiconductor Division at Tianjin Jiu Ri New Materials Co., will present on the theme of "Domestic Photoresist Localization - Jiu Ri's Progress" [2][4]. - The conference will include specialized forums on advanced lithography technologies, photoresists, and materials and equipment, providing a comprehensive overview of the industry [32][33]. - Notable sessions will cover topics such as the development trends of advanced packaging materials and the characterization of IC photoresists [19][25].