【圆满落幕】深剖光刻产业国产化进程中的关键难题 | 2025势银（第五届）光刻产业大会（PRIC 2025）

Core Viewpoint - The 2025 TrendBank Photolithography Industry Conference held in Hefei focused on advanced photolithography technologies and the current state of domestic photolithography materials, discussing innovation and industry upgrades to enhance self-sufficiency and quality levels in China [1][2]. Group 1: Conference Highlights - The conference covered cutting-edge photolithography technologies such as EUV, electron beam lithography, and nanoimprint lithography, along with the latest research progress and application prospects [1]. - Key discussions included the domestic production status and technical bottlenecks of photolithography materials like photoresists, wet electronic chemicals, and masks [1]. - The conference emphasized the importance of breaking barriers and fostering collaboration in the development of domestic photolithography equipment [12]. Group 2: Industry Developments - The domestic photolithography chemical materials industry is developing a complete supply chain, with significant production capacities established, including 4,000 tons/year for display photoresists and 500 tons/year for semiconductor photoresists [14]. - Research on trace gases under DUV light is complex, requiring precise detection methods and monitoring setups to study potential chemical reactions [16]. - Digital lithography, particularly laser direct-write lithography, is gaining traction in specific fields, with optimistic market prospects expected to mature over the next three years [20]. Group 3: Technical Challenges - The application of excimer laser gas technology faces challenges such as gas mixing, impurity removal, and product testing, despite its advantages in resolution and production efficiency [22]. - Trace cations and anions significantly impact downstream products, with various sources of contamination identified [24].