高数值孔径光刻机，SK海力士首次导入

Group 1 - SK Hynix has introduced the first mass-production High-NA EUV lithography machine in the memory industry at its M16 factory in Icheon, South Korea, which is expected to significantly enhance the precision of circuit patterning and improve resolution [2][3] - The new TWINSCAN EXE:5200B machine from ASML has an optical performance improvement of 40% compared to existing EUV machines, allowing for the production of circuit patterns with 1.7 times higher precision and a 2.9 times increase in integration density [3] - The introduction of this advanced equipment is crucial for meeting the future demands of the semiconductor market for ultra-fine processes and high integration, thereby reinforcing SK Hynix's position in the high-value memory market and solidifying its technological leadership [3] Group 2 - The global semiconductor market is becoming increasingly competitive, necessitating rapid development and supply of high-end products to meet customer needs, which SK Hynix aims to achieve through close collaboration with partners [3] - Since the introduction of EUV technology in the fourth generation 10nm DRAM in 2021, SK Hynix has been expanding its application in advanced DRAM manufacturing to enhance product performance and production efficiency [3]