涉及30%员工！台积电重大调整！

Core Viewpoint - TSMC is exiting the GaN foundry business and restructuring its wafer fabs to optimize operations and reduce costs, while focusing on advanced packaging and internal development of EUV mask protection films [2][4][6]. Group 1: TSMC's Strategic Moves - TSMC will close its 6-inch GaN foundry in Hsinchu Science Park within two years and integrate its three 8-inch fabs to address labor shortages and improve asset utilization [2]. - The 6-inch fab will be repurposed for CoPoS advanced packaging, while the 8-inch fabs will focus on internal production of EUV mask protection films to reduce reliance on ASML and its supply chain [4]. - TSMC's investment in advanced process nodes has been significant over the past decade, but the high costs associated with EUV technology are prompting a shift in strategy to enhance yield and cost efficiency [4]. Group 2: Importance of Mask Protection Films - EUV technology requires new mask and protection film methods, as traditional organic films lack the necessary transparency and stability for EUV processes [5]. - TSMC's proprietary protection films are expected to optimize workflows, improve yields, expand capacity, and reduce costs, thereby enhancing profitability and maintaining its competitive edge [5]. - The transition to in-house mask protection film development is crucial for TSMC as it moves towards 2nm processes and expands CoWoS packaging technology [5]. Group 3: Market Dynamics and Competition - The exit from the GaN sector highlights intense price competition from Chinese competitors in the third-generation semiconductor market [6]. - Global IDM manufacturers, including Texas Instruments and Infineon, are also expanding their internal GaN capacities, indicating a growing focus on this technology [6].