半导体行业观察·2025-10-01 00:32Core Insights - The Ninth International Workshop on Advanced Patterning Solutions (IWAPS) will be held on October 14-15, 2025, in Shenzhen, focusing on advanced lithography technologies and providing a platform for global experts to exchange ideas and innovations in the semiconductor industry [3][4]. Event Overview - The event is organized by the China Integrated Circuit Innovation Alliance and the Chinese Optical Society, with support from various research institutions and industry alliances [3][5]. - IWAPS aims to create a comprehensive dialogue platform covering the entire lithography industry chain, including equipment, process technology, metrology, mask materials, computational lithography, and system optimization [3][4]. Participation and Registration - Participants from academia and industry are encouraged to register for the event, with registration details provided through a QR code and a link [6][8]. - The conference will feature keynote speeches from leading experts in the field, addressing critical advancements and challenges in lithography technology [12][48]. Conference Schedule - The agenda includes plenary sessions, patterning sessions, AI and process discussions, and various parallel sessions focusing on specific topics such as mask equipment, computational lithography, and photoresist technology [11][12][15]. - Notable keynote speakers include representatives from D2S, Siemens, and the Chinese University of Hong Kong, discussing topics like VLSI mask optimization and advancements in lithography processes [48][51]. Networking Opportunities - The event will facilitate networking among semiconductor companies, research institutions, and investment firms, providing insights into opportunities within the Guangdong-Hong Kong-Macao Greater Bay Area [3][4]. - A welcome banquet will be held for all attendees, promoting further interaction and collaboration [12].