首次！我国芯片领域取得新突破

Core Insights - The article discusses a breakthrough in photolithography technology, which is essential for the continuous miniaturization of integrated circuit chip manufacturing [2] - A research team led by Professor Peng Hailin from Peking University has utilized cryo-electron tomography to analyze the microscopic three-dimensional structure and behavior of photoresist molecules in a liquid environment [2] - This research aims to significantly reduce photolithography defects, which have been a critical bottleneck in improving yield rates for advanced processes at 7nm and below [2] Group 1 - Photolithography is a core step in chip manufacturing, where the movement of photoresist in the developer directly impacts circuit pattern accuracy and chip yield [2] - The microscopic behavior of photoresist in the developer has historically been a "black box," limiting industrial process optimization to trial and error [2] - The research team achieved a high-resolution three-dimensional "panorama" with a resolution better than 5 nanometers, overcoming traditional observational limitations [2] Group 2 - Cryo-electron tomography provides a powerful tool for analyzing liquid-phase interfacial reactions at the atomic/molecular scale [3] - Understanding the structure and microscopic behavior of polymers in liquid can enhance defect control and yield improvement in key processes such as photolithography, etching, and wet cleaning [3]