EUV光刻机，很难被颠覆

Group 1 - The article discusses the ongoing debate about Nano Imprint Lithography (NIL) potentially disrupting Extreme Ultraviolet (EUV) lithography, highlighting that while NIL has interesting applications, it currently does not match the capabilities of EUV [1][27] - NIL technology was invented in 1996 and commercialized in 2001, with Canon acquiring Molecular Imprints Inc. in 2014 to position NIL as a successor to DUV lithography [4][6] - Canon's NIL technology, known as J-FIL, involves a unique process of applying photoresist and imprinting patterns, which theoretically offers advantages in speed and cost compared to EUV [7][12][25] Group 2 - The NIL process involves creating a master template, which is then used to produce working templates for wafer patterning, with significant challenges related to the durability and defect rates of these templates [14][29] - Key challenges for NIL include the lifespan of masks, overlay accuracy, mask pattern roughness, and customer feedback indicating that NIL is not yet ready for advanced chip manufacturing [29][35] - Despite theoretical advantages in resolution and cost, practical issues such as mask durability and defect rates hinder NIL's competitiveness against EUV technology [27][29][35]