ASML Holding(US:ASML) 日经中文网·2025-12-10 02:56Core Viewpoint - The development of a circuit template for 1.4-nanometer semiconductors by Dai Nippon Printing (DNP) and Canon's nanoimprint manufacturing device could significantly reduce the manufacturing costs and energy consumption of advanced semiconductors, particularly for AI applications and autonomous driving [2][5]. Group 1: Technology Development - DNP has created a circuit template that can be used for 1.4-nanometer processes, which is a significant advancement in semiconductor manufacturing technology [2]. - Canon's nanoimprint manufacturing device uses a stamp-like method to create circuits on wafers, which is expected to consume one-tenth of the energy compared to traditional methods [2][5]. - The new template technology allows for the doubling of semiconductor circuit density through a technique called double patterning [4]. Group 2: Market Implications - The current leading technology for advanced semiconductor production relies on EUV lithography machines, which are expensive (approximately 30 billion yen) and account for 30-50% of total manufacturing costs [4]. - Canon's nanoimprint devices are expected to be priced in the tens of billions of yen, making them a more economical option for semiconductor manufacturers [5]. - Major companies like TSMC and Samsung are interested in adopting 1.4-nanometer semiconductors, with TSMC planning to start mass production in 2028 and Samsung in 2027 [5]. Group 3: Industry Dynamics - Historically, Canon and Nikon held over half of the global market share in lithography machines, but ASML currently dominates with a 90% market share in advanced processes [5]. - If the nanoimprint market expands, Japanese companies like DNP and Fujifilm could regain competitiveness in the semiconductor manufacturing sector [5]. - Canon has begun supplying nanoimprint devices to the Texas Institute for Electronics, indicating a potential shift in the market dynamics between EUV lithography and nanoimprint technologies [6].