Workflow
Kinex™ Bonding System
icon
Search documents
Applied Materials Unveils Next-Gen Chipmaking Products to Supercharge AI Performance
Globenewswire· 2025-10-07 12:30
Core Insights - Applied Materials, Inc. has introduced new semiconductor manufacturing systems aimed at enhancing the performance of advanced logic and memory chips essential for AI computing [4] - The new products focus on three critical areas: leading-edge logic with Gate-All-Around (GAA) transistors, high-performance DRAM including high-bandwidth memory (HBM), and advanced packaging for optimized chip performance, power consumption, and cost [4] Group 1: New Technologies - The Xtera™ Epi system enables higher performance GAA transistors at 2nm and beyond by depositing void-free, uniform epitaxial layers [1][12] - The Kinex™ Bonding system is the first integrated die-to-wafer hybrid bonder, facilitating the production of higher performance, lower power advanced logic and memory chips [2][12] - The PROVision™ 10 eBeam metrology system enhances yield of complex 3D chips by providing sub-nanometer resolution, fast throughput, and deep imaging [3][12] Group 2: Collaboration and Development - The company is focused on driving materials engineering breakthroughs to improve performance and power efficiency in AI chip production [5] - Applied Materials collaborates closely with customers to co-develop solutions that accelerate chipmaker roadmaps and enable significant advancements in logic, memory, and advanced packaging [5] Group 3: System Features and Benefits - The Kinex™ system integrates all critical hybrid bonding process steps, offering advantages such as improved bonding consistency and quality, and better management of complex multi-die packages [8][13] - The Xtera system features a unique low-volume chamber architecture that allows for void-free GAA source-drain structures with 50% lower gas usage than conventional methods, achieving over 40% improvement in cell-to-cell uniformity [10][11] - The PROVision™ 10 system utilizes cold field emission technology, increasing nanoscale image resolution by up to 50% and imaging speed by up to 10 times compared to traditional methods, supporting advanced process control tasks [14][15]