Core Viewpoint - The semiconductor materials sector, particularly sputtering targets, is often undervalued despite its critical role in the semiconductor industry. The ongoing global restructuring of the semiconductor supply chain presents significant opportunities for domestic alternatives to established foreign suppliers [2][4]. Industry Overview - Sputtering targets are essential materials used in physical vapor deposition (PVD) processes, crucial for forming functional thin films on substrates like silicon wafers. They are vital for the performance, yield, and reliability of chips [6][8]. - The demand for sputtering targets is increasing due to advancements in chip manufacturing processes, particularly as technology progresses to smaller nodes (e.g., below 7nm) [9]. Classification of Targets - Sputtering targets can be classified by shape (long, square, round), chemical composition (metal, alloy, ceramic), and application (semiconductor, display, solar cells) [10][11]. - Key materials include high-purity metals like aluminum, copper, and tantalum, which are used in various layers of semiconductor devices [12][13]. Industry Chain Analysis - The upstream supply involves high-purity metals and equipment, with significant reliance on imports for raw materials. Domestic companies are beginning to develop production capabilities [15][16]. - The midstream manufacturing process is highly technical, requiring precise control over various production stages to meet stringent quality standards [18]. - The downstream application primarily focuses on semiconductor chip manufacturing, where sputtering targets are used in critical structures like interconnect layers and barriers [22][23]. Market Situation - The global sputtering target market has grown from 82.1 billion yuan in 2018 to 116.3 billion yuan in 2022, with a compound annual growth rate (CAGR) of 9.1%. It is projected to reach 194.5 billion yuan by 2027, with a CAGR of 10.7% [46][48]. - The Chinese market for sputtering targets has also seen significant growth, with a CAGR of 14.4% from 2018 to 2022, expected to continue at 15.8% through 2027 [49][52]. Competitive Landscape - The global market is dominated by a few key players, with American and Japanese companies holding approximately 80% of the market share. Major companies include JX Nippon Mining & Metals, Honeywell, and Tosoh [60][62]. - Domestic companies like Jiangfeng Electronics and Yuyuan New Materials are making strides in technology and market penetration, particularly in lower-end products, but still face challenges in high-end target production [64]. Future Development Trends - There is a strong trend towards higher purity and quality in sputtering targets, driven by the need for advanced semiconductor processes [68]. - Emerging applications in AI, IoT, and 5G are expected to drive demand for high-performance chips, further boosting the sputtering target market [69]. - The industry is likely to see increased mergers and acquisitions as companies seek to enhance their technological capabilities and market presence [71].