上海光机所EUV光刻技术获重大突破，中国芯片生产有望不再被美国“卡脖子”｜钛媒体AGI

Core Viewpoint - China has made significant breakthroughs in extreme ultraviolet (EUV) lithography technology, specifically in developing solid-state laser-driven light sources, which could alleviate reliance on U.S. technology and enhance domestic chip production capabilities [2][6]. Group 1: Technological Advancements - The research team led by Lin Nan at the Shanghai Institute of Optics and Fine Mechanics has successfully developed a laser plasma (LPP) EUV light source using solid-state lasers, achieving a conversion efficiency (CE) of 3.42%, which is higher than that of teams from the Netherlands and Switzerland [4][10]. - The theoretical maximum conversion efficiency of the new light source could approach 6%, indicating potential for further advancements in domestic EUV lithography technology [4]. - The solid-state laser-driven LPP-EUV light source can provide watt-level power, making it suitable for EUV exposure verification and mask inspection, despite its current efficiency being lower than commercial CO2 lasers [9][10]. Group 2: Market Context and Implications - ASML, the only manufacturer of EUV lithography machines, has maintained a 100% market share since deploying this technology in 2019, with major clients including Samsung, TSMC, and Intel [5][11]. - Due to U.S. export controls, ASML has been prohibited from selling advanced EUV lithography machines to China since 2019, which has hindered China's chip technology development [11]. - Despite these restrictions, ASML's 2024 net sales reached €28.263 billion, with China becoming its largest market, accounting for €10.195 billion or 36.1% of total revenue [10][13]. Group 3: Future Outlook - Lin Nan's team is planning further research to enhance the efficiency of the solid-state laser-driven EUV light source, which could lead to advancements in domestic EUV lithography capabilities [4][10]. - ASML's CFO has acknowledged the potential for China to develop EUV light sources but believes it will take many years for China to produce advanced EUV lithography equipment [10][11].