ASML Holding(US:ASML) 3 6 Ke·2025-05-27 10:38Group 1 - The UK has established the second electron beam lithography (EBL) center globally, which is capable of producing semiconductor chips with a resolution below 5 nanometers, using a 200kV system from JEOL [1][2] - The new EBL facility at the University of Southampton is expected to enhance the UK's capabilities in semiconductor research and development, particularly in quantum computing and silicon photonics [2][3] - The EBL technology, while advanced, is primarily used for academic research and training, and does not directly compete with ASML's EUV lithography machines [8][10] Group 2 - Electron beam lithography (EBL) is a mature technology that has been in use since the 1960s, providing higher resolution than traditional photolithography, making it suitable for mask fabrication and small-scale semiconductor production [3][4] - Major manufacturers of EBL systems include Raith, NBL, JEOL, NuFlare, and IMS Nanofabrication, with each company focusing on different aspects of the technology and market [5][6] - ASML, while dominant in the EUV lithography market, is also developing its own EBL technology, indicating ongoing competition and innovation within the sector [8][10]