鼎龙控股申请CMP水性浆料组合物及其应用专利，提供STI制程自动停止抛光

Group 1 - The core viewpoint of the news is the application for a patent titled "CMP Water-based Slurry Composition and Its Application" by multiple companies, indicating advancements in chemical mechanical polishing technology [1][2] - The patent application was filed on April 2025, and it focuses on a water-based slurry composition that minimizes non-uniformity in the STI process and extends polishing time without risking over-polishing of dielectric silicon dioxide films [1] - Wuhan Dingze New Materials Technology Co., Ltd. was established in 2017 with a registered capital of 15 million RMB and has invested in 3 companies, holding 30 patents and 7 administrative licenses [1][2] Group 2 - Dingze (Xiantao) New Materials Technology Co., Ltd. was founded in 2022 with a registered capital of 10 million RMB, focusing on manufacturing in the computer, communication, and other electronic devices sector, holding 13 patents and 8 administrative licenses [2] - Hubei Dinglong New Materials Co., Ltd. was established in 2018 with a registered capital of 20 million RMB, also in the computer and communication manufacturing sector, holding 3 patents and 2 administrative licenses [2] - Hubei Dinglong Holdings Co., Ltd. was founded in 2000 with a registered capital of approximately 938.28 million RMB, primarily engaged in capital market services, with 28 investments, 36 bidding projects, 34 trademark registrations, and 237 patents [2]