ASML Holding(US:ASML) Sou Hu Cai Jing·2025-12-15 02:26Group 1 - The CEO of ASML, Christophe Fouquet, expects the High NA EUV lithography machines to be officially put into large-scale production for advanced processes between 2027 and 2028 [1] - Intel is currently the most proactive in adopting the new generation of patterning technology, with its High NA EUV-supported Intel 14A node set to launch in 2027 [3] - ASML is collaborating with customers to minimize downtime of the new equipment, which is currently being tested by clients like Intel, showing good imaging and resolution performance [3] Group 2 - ASML has a general concept of its technology roadmap for the next 10 to 15 years and has initiated research on the next generation of Hyper NA EUV, laying the groundwork for deployment in the 2030s [4]