Core Insights - ASML's new High-NA EUV lithography equipment, priced at approximately $400 million (around NT$12 billion), is currently not being adopted by TSMC for its A14 process due to the lack of compelling reasons to justify the expense [1][2] - TSMC's senior vice president, Zhang Xiaoqiang, stated that significant technological upgrades can still be achieved without the High-NA EUV equipment, focusing instead on scaling benefits and extending the lifespan of existing Low-NA EUV equipment [1] - In contrast, Intel plans to utilize High-NA EUV machines in its upcoming 14A process to enhance its competitiveness against TSMC, while still allowing customers to opt for older, proven technologies [2] Summary by Sections ASML Equipment Pricing and Adoption - The High-NA EUV lithography machine is priced at nearly $400 million, making it one of the most expensive semiconductor manufacturing devices globally, with a weight of 180 tons and a size comparable to a double-decker bus [2] - TSMC has expressed that it currently does not see a necessity to adopt this expensive technology for its A14 and subsequent processes [1] Competitive Landscape - Intel is moving forward with plans to implement High-NA EUV technology in its future processes, aiming to revitalize its foundry business and improve its competitive stance against TSMC [2] - ASML's CEO mentioned that customers are expected to begin mass production preparations for High-NA equipment between 2026 and 2027, indicating a potential future shift in industry standards [2]
台积电:没到万不得已,不用新一代光刻机