Core Viewpoint - TSMC reaffirms that its 1.4nm process technology does not require high numerical aperture (High-NA) EUV lithography machines, stating that there is currently no compelling reason to use them [1][2] Group 1 - TSMC's next-generation process technologies, including A16 (1.6nm) and A14 (1.4nm), will not utilize High-NA EUV equipment [1] - TSMC's A14 process technology boasts a performance improvement of up to 15% at the same power and complexity, or a power reduction of 25% to 30% at the same frequency [2] - TSMC is continuously exploring ways to extend the lifespan of existing EUV technology while achieving miniaturization advantages [1][2] Group 2 - The latest High-NA EUV lithography machines from ASML are the most advanced in the world, with a price tag of $400 million, making them prohibitively expensive for many manufacturers [2] - As of now, ASML has delivered a total of 5 High-NA EUV machines to clients, including Intel and Samsung [2] - Intel is set to receive the world's first High-NA EUV lithography machine in December 2023 [2]
台积电惊爆:世界最先进EUV光刻机只卖了5台!