Core Viewpoint - The article discusses advancements in lithography technology, particularly the development of "Beyond-EUV" (B-EUV) lithography, which utilizes a wavelength of 6.5nm to 6.7nm, potentially allowing for resolutions below 5nm, surpassing current EUV technology [2][3][18]. Summary by Sections Lithography Technology Evolution - The evolution of lithography has progressed from contact to projection methods, with current mainstream technology using extreme ultraviolet (EUV) light at a wavelength of 13.5nm [3][5]. - The need for higher resolution in lithography can be achieved by either increasing numerical aperture (NA) or shortening the wavelength [3]. Challenges of EUV and B-EUV - EUV technology faces challenges due to its high absorption rates by materials, necessitating advanced mirrors for effective light reflection [5][6]. - B-EUV technology is still in its infancy, with no industry-standard methods for generating the required 6.7nm wavelength radiation [6][19]. Innovations in Light Sources - Various companies are exploring new light sources for lithography, including the development of high-efficiency laser systems and compact, high-power sources [10][11][13]. - Inversion is working on Laser Wakefield Acceleration (LWFA) to create high-energy light sources, while xLight is developing free electron lasers (FEL) to enhance EUV power output significantly [13][16]. Breakthroughs in Photoresist Materials - Johns Hopkins University has made significant progress in photoresist materials, discovering that metals like zinc can effectively absorb B-EUV light and trigger chemical reactions for fine pattern etching [18][19]. - The development of a new technique called Chemical Liquid Deposition (CLD) allows for the creation of thin films that can be used in semiconductor manufacturing, highlighting the importance of matching materials with the appropriate wavelengths [19][20]. Future Prospects - The advancements in B-EUV technology and associated materials could lead to significant improvements in semiconductor manufacturing efficiency and cost reduction, although challenges remain before widespread adoption [20].
Beyond-EUV,新方向!