EUV光刻机，订单火爆

Core Viewpoint - ASML anticipates delivering 10 High-NA EUV and 56 EUV lithography machines by 2027, driven by increased orders from Intel and Samsung, indicating a rising demand for advanced semiconductor manufacturing technology [1] Group 1: Orders and Demand - Intel has increased its order for High-NA EUV machines from 1 to 2 and for EUV machines from 3 to 5, while Samsung raised its EUV order from 5 to 7 [1] - SK Hynix is set to receive 20 EUV machines by 2027 and has also increased its High-NA EUV order from 1 to 2 [1] - The overall market demand for exposure equipment is on an upward trend, despite some semiconductor manufacturers delaying the introduction of new High-NA EUV technology [1] Group 2: Technology and Efficiency - Intel's first two High-NA EUV machines have shown significant improvements in efficiency and reliability compared to previous EUV machines, completing tasks with fewer exposures and processing steps [2] - The new High-NA EUV machines require only one exposure and a few processing steps, compared to three exposures and around 40 steps for earlier models [2] Group 3: Installation and Cost - Installation of a High-NA EUV machine requires 250 engineers and takes approximately 6 months [3] - The price of a High-NA EUV machine is approximately €350 million, equivalent to about 2.7 billion yuan, making it essential for major wafer manufacturers to achieve large-scale production of advanced processes below 2nm [3]