Group 1 - ASML's CEO, Christoph W. F., highlighted the contradictions in the West's export restrictions on lithography machines to China, emphasizing the need for a "subtle balance" in technology export policies [2] - Currently, ASML is prohibited from exporting all EUV lithography equipment and the most advanced DUV lithography equipment to China, creating a significant technological gap, with the equipment available to China being eight generations behind the latest technology [2] - The CEO warned that excessive restrictions could push China to fully develop its own technology, potentially leading to a strong competitor for the West in the long run [3] Group 2 - The ongoing technological competition surrounding lithography machines reflects a strategic struggle amid the restructuring of the global technology supply chain [3] - The article suggests that while technology barriers may slow down development, they cannot stop a nation's determination to achieve technological independence [3] - The ultimate outcome of the technological gap will depend on the strength of research and development capabilities and industry resilience [3]
ASML CEO:中国绝不接受卡脖子