Core Viewpoint - Shengmei Shanghai has delivered its first advanced photoresist curing equipment, Ultra Lith BK (Baker), to a leading global display screen manufacturer, addressing challenges in advanced lithography processes [1] Group 1: Equipment Features - The Ultra Lith BK (Baker) is designed to tackle issues such as insufficient uniformity, temperature drift, and critical dimension variation in advanced lithography processes [1] - The equipment aims to help manufacturers maintain stable yield and pattern fidelity as device sizes continue to shrink [1] - It enables highly stable and repeatable lithography processes [1]