晶圆清洗装置

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华海清科申请一种晶圆清洗装置专利,可移除积聚于转动件的颗粒物
Jin Rong Jie· 2025-08-16 11:23
Core Viewpoint - Huahai Qingke Co., Ltd. has applied for a patent for a "wafer cleaning device," indicating its focus on innovation in the chemical manufacturing sector [1] Company Overview - Huahai Qingke Co., Ltd. was established in 2013 and is located in Tianjin, primarily engaged in the manufacturing of chemical raw materials and products [1] - The company has a registered capital of 236.724893 million RMB [1] - Huahai Qingke has invested in 10 enterprises and participated in 229 bidding projects [1] - The company holds 67 trademark registrations and 700 patent registrations, along with 31 administrative licenses [1] Patent Details - The patent application, published as CN120497163A, was filed on August 2022 [1] - The cleaning device includes a tank, a supporting component for vertically supporting and rotating the wafer, a cleaning brush that rolls horizontally, and a cleaning component that sprays fluid to remove particles from the rotating component [1] - The direction of the spray from the cleaning component matches the rotation direction of the wafer being cleaned [1]