Workflow
高温SPM机台
icon
Search documents
芯源微:力争在前道化学清洗赛道实现跨越式发展,打造第二增长极
Group 1 - Company conducted investor relations activities from July 10 to July 16, receiving various institutional investors [1] - Company specializes in the R&D, production, and sales of semiconductor equipment, with a product range that includes photoresist coating and developing equipment, single-wafer wet processing equipment, and more [1] - Company has established four main business segments: front-end coating and developing equipment, front-end cleaning equipment, back-end advanced packaging equipment, and small-size compound semiconductor equipment [1] Group 2 - Company focuses on the integrated circuit sector, with three main business pillars: front-end coating and developing, front-end cleaning, and back-end advanced packaging [2] - Company aims to expand its customer base in regions such as Taiwan, South Korea, and Southeast Asia while maintaining existing clients [1][2] - Company’s new generation coating and developing machine features a six-layer symmetrical architecture, enhancing scheduling efficiency to meet future high-end lithography machine capacity needs [2] Group 3 - Company acknowledges the technological gap with foreign competitors but is committed to increasing R&D investment to enhance product competitiveness [2] - Company aims for rapid growth in front-end chemical cleaning products, establishing a second growth driver for long-term development [2] - Northern Huachuang has become the controlling shareholder of the company, holding approximately 17.87% of its total shares and nominating a majority of the board members [2][3] Group 4 - The collaboration between the company and Northern Huachuang is expected to create synergies, allowing for integrated solutions in the integrated circuit equipment sector [3] - Both companies have complementary product offerings, which can enhance their market position and operational efficiency [3] - The partnership may lead to improved collaboration in R&D, supply chain management, and customer resource sharing [3]