Core Viewpoint - Toray has successfully developed the STF-2000 photosensitive polyimide, which allows for fine processing with a line width of 30 micrometers on films up to 200 micrometers thick, targeting applications in new MEMS devices [1][9]. Group 1: Product Features - STF-2000 can achieve a high aspect ratio of 7 and high-resolution patterns below L/S=4μm, making it suitable for advanced microfabrication [1][9]. - The product complies with EU environmental regulations, being free from N-Methyl-2-pyrrolidone (NMP) and per- and polyfluoroalkyl substances (PFAS) [2]. - The development of thick film versions is underway, with mass production expected by 2025 [2]. Group 2: Technical Advantages - STF-2000 can form complex patterns using standard exposure systems without the need for expensive upgrades to KrF or ArF lithography systems, significantly reducing technical upgrade costs for companies, especially small and medium-sized enterprises [6]. - The product utilizes an alkaline water solution for development, maintaining inherent advantages such as excellent heat and chemical resistance, mechanical properties, insulation, and X-ray resistance [9]. Group 3: Market Position - Toray is recognized as one of the most successful companies in the commercialization of positive photosensitive polyimides, and the new product combines the advantages of both positive and negative photosensitive polyimides [7].