Core Viewpoint - Company has launched six new semiconductor equipment products, enhancing its product portfolio in plasma etching, atomic layer deposition, and epitaxy technologies, which is expected to positively impact its market expansion and performance growth in the semiconductor equipment sector [2][3]. Group 1: New Product Launch - The new products include two etching devices and four film deposition devices, specifically targeting critical processes in semiconductor manufacturing [2]. - The CCP capacitive high-energy plasma etching machine, Primo UD-RIE, is designed for high aspect ratio etching, featuring six single reaction chamber setups for improved etching precision and production efficiency [2]. - The Primo Menova 12-inch ICP etching device focuses on metal etching, suitable for power semiconductors, memory devices, and advanced logic chip manufacturing [2]. Group 2: Film Deposition Equipment - The four new film deposition products consist of three atomic layer deposition devices and one epitaxy device [3]. - The Preforma Uniflash metal gate series includes TiN, TiAl, and TaN products, catering to advanced logic and storage device applications [3]. - The PRIMIO Epita® RP is a unique dual-chamber low-pressure epitaxy device, notable for its compact reaction chamber design and flexibility in configuration, which reduces production costs and chemical consumption while enhancing production efficiency [3]. Group 3: Company Performance - In the first half of the year, the company reported total revenue of 4.961 billion yuan, representing a year-on-year increase of 43.88% [5]. - The net profit attributable to shareholders reached 706 million yuan, marking a year-on-year growth of 36.62% [5]. - The company is recognized as a leading manufacturer of GaN-based LED equipment and has successfully developed LPCVD and ALD film deposition equipment, with multiple products entering the market and receiving substantial repeat orders [4].