Core Viewpoint - Lace Lithography AS is developing a new lithography technology that utilizes atoms to define features, surpassing the resolution limits of extreme ultraviolet (EUV) lithography, potentially extending Moore's Law [1][2]. Group 1: Company Overview - Lace Lithography AS was founded in July 2023 by Bodil Holst and Adria Salvador Palau, with operations currently based in Barcelona, Spain [1]. - The company claims its atomic lithography technology can provide capabilities 15 years ahead of current technologies, with lower costs and energy consumption [1]. Group 2: Technology Details - The traditional EUV systems operate at a wavelength of 13.5nm, while the atomic lithography technology can achieve direct maskless patterning with resolutions even finer than those limited by wavelength in EUV systems [1]. - The technology is expected to support the continued miniaturization of transistors [1]. Group 3: Funding and Projects - Lace Lithography has raised approximately €450,000 in seed funding from various investors, including Runa Capital and the European Innovation Council [2]. - The FabouLACE project, funded by the EU with a budget of €2.5 million, aims to develop helium atom lithography technology and is set to run from December 1, 2023, to November 30, 2026 [2]. - The NanoLACE project, which started in 2019 and ends on December 31, 2024, has received €3.36 million in funding [2].