如果您希望可以时常见面，欢迎标星收藏哦~ 来源：内容 编译自 eenewseurope ，谢谢。 据报道，初创公司Lace Lithography AS（挪威卑尔根）正在开发一种光刻技术，该技术使用向表 面发射的原子来定义特征，其分辨率超出了极紫外光刻技术的极限。 该公司由卑尔根大学首席执行官 Bodil Holst 教授和首席技术官 Adria Salvador Palau 于 2023 年 7 月共同创立，后者在卑尔根大学获得博士学位，但目前在西班牙巴塞罗那运营。 传统的 EUV 系统使用 13.5nm 波长的光，通过一系列反射镜和掩模在晶圆上形成图案。原子光刻 技术能够实现直接无掩模图案化，其分辨率甚至小于受波长限制的 EUV 系统所能达到的分辨率。 该公司在其网站上声称："通过使用原子代替光，我们为芯片制造商提供了领先当前技术 15 年的 功能，而且成本更低、能耗更低。" Salvador Palau 和 Holst 教授共同撰写了一篇发表在《物理评论 A》上的论文，题为《利用中性 氦原子进行真实尺寸表面映射》。该论文详细介绍了立体氦显微镜的实现和操作。 Lace Litho 所称的 BEUV 理论上 ...

Core Viewpoint - Lace Lithography AS is developing a new lithography technology that utilizes atoms to define features, surpassing the resolution limits of extreme ultraviolet (EUV) lithography, potentially extending Moore's Law [1][2]. Group 1: Company Overview - Lace Lithography AS was founded in July 2023 by Bodil Holst and Adria Salvador Palau, with operations currently based in Barcelona, Spain [1]. - The company claims its atomic lithography technology can provide capabilities 15 years ahead of current technologies, with lower costs and energy consumption [1]. Group 2: Technology Details - The traditional EUV systems operate at a wavelength of 13.5nm, while the atomic lithography technology can achieve direct maskless patterning with resolutions even finer than those limited by wavelength in EUV systems [1]. - The technology is expected to support the continued miniaturization of transistors [1]. Group 3: Funding and Projects - Lace Lithography has raised approximately €450,000 in seed funding from various investors, including Runa Capital and the European Innovation Council [2]. - The FabouLACE project, funded by the EU with a budget of €2.5 million, aims to develop helium atom lithography technology and is set to run from December 1, 2023, to November 30, 2026 [2]. - The NanoLACE project, which started in 2019 and ends on December 31, 2024, has received €3.36 million in funding [2].