环绕栅极(GAA)工艺

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一台24亿!ASML光刻机入厂!
国芯网· 2025-03-14 04:33
Core Viewpoint - The article emphasizes the acceleration of the adoption of High-NA EUV lithography equipment in the semiconductor industry, highlighting its significance for advanced semiconductor manufacturing processes, particularly for 2nm technology [2][3]. Group 1: High-NA EUV Equipment Adoption - Samsung Electronics has introduced the first High-NA EUV lithography machine, EXE:5000, valued at approximately 24.88 billion RMB, to enhance its semiconductor manufacturing capabilities [2]. - The High-NA EUV equipment increases the numerical aperture from 0.33 to 0.55, significantly improving lithography precision and enabling narrower line widths, which reduces power consumption and enhances data processing speed [2]. - Intel has also accelerated its procurement of High-NA EUV equipment, having purchased a total of 6 units, with the first two already in production, capable of processing 30,000 wafers per quarter [3]. Group 2: Market Position and Performance - Despite being ranked second in the global foundry market in Q4 2023, Samsung's revenue decreased by 1.4% to 3.26 billion USD, resulting in a market share of only 8.1% [4]. - TSMC maintains a dominant position with a market share of 67%, highlighting the competitive landscape in the semiconductor foundry sector [4].