Core Viewpoint - The successful acceptance and delivery of China's first PL-SR series inkjet stepper nano-imprinting equipment marks a significant advancement in the high-end semiconductor equipment manufacturing sector, breaking the foreign monopoly in this technology [1] Group 1: Technological Breakthroughs - The PL-SR series equipment supports nano-imprinting lithography processes with a line width of less than 10nm, surpassing Canon's FPA-1200NZ2C, which supports a line width of 14nm [1] - The equipment features several key innovations, including a self-developed template profile control system and an inkjet algorithm system for nano-imprinting photoresist, showcasing strong independent innovation capabilities [1] Group 2: Cost and Efficiency Advantages - Compared to traditional EUV lithography technology, nano-imprinting technology can reduce equipment investment costs by 60% and limit power consumption to 10% of that required by EUV technology [1] - This technology presents unique advantages in the storage chip manufacturing sector due to its suitability for repetitive graphic structures, providing a new technological pathway for domestic storage chip manufacturers to overcome process bottlenecks [1]