Core Viewpoint - The company has received an order for a prototype high-temperature sulfuric acid cleaning (high-temperature SPM) equipment from a client, marking a significant step towards breaking the overseas monopoly in the domestic high-temperature SPM cleaning equipment market [1][2] Group 1 - The prototype equipment is currently in the assembly and testing phase, having passed multiple performance tests and marathon tests, with some indicators reaching internationally leading levels [1] - The high-temperature SPM cleaning process can cover various applications for 12-inch wafer critical processes, including PR-strip, Post-CMP, and NiPt remove, which are recognized as high-difficulty wet processes dominated by overseas suppliers [1] - The equipment features domestic leading and internationally competitive high-temperature control capabilities, covering high-temperature SPM processes up to 190°C, with a temperature control range of ±2°C, outperforming major overseas suppliers' ±5°C [1] Group 2 - The company plans to focus on completing the delivery and validation of the equipment, expanding customer adoption in high-end applications, and leveraging its technical team's advantages in semiconductor wet processing technology to address industry pain points and enhance customer efficiency [2]