刻蚀用大直径硅材料
Search documents
【科技自立·产业自强】神工股份:以半导体材料创新筑牢产业根基
Zheng Quan Shi Bao Wang· 2025-10-02 02:12
Core Viewpoint - The company, ShenGong Co., Ltd., is a global leader in the production of large-diameter silicon materials for etching, leveraging proprietary technologies to enhance production quality and reduce costs [1] Group 1: Technology and Production Capabilities - The company has developed a "non-magnetic large-diameter single crystal silicon manufacturing technology" that suppresses silicon melt convection without relying on strong magnetic fields, enabling high-quality production of high-purity large-diameter single crystal silicon and significantly lowering unit costs [1] - The "solid-liquid coexistence interface control technology" is designed to meet the varying needs of crystal growth stages, ensuring product yield and parameter consistency, with both technologies being at the forefront of the international industry [1] - The annual production capacity of semiconductor materials has reached 500 tons, making the company the largest in the world in this sector [1] Group 2: Integrated Supply Chain and Key Technologies - As one of the few companies with a complete "materials-components-applications" integrated factory for etching components, the company’s technology spans critical links in the industry chain [1] - The "silicon electrode micro-deep hole processing technology" achieves burr-free, high-cleanliness processing of nearly a thousand micro-deep holes, while the "silicon component precision etching and cleaning technology" utilizes multi-stage displacement cleaning and specialized processes to thoroughly remove micro-pore impurities [1] - The company supplies silicon components for 8-inch and 12-inch etching machines in bulk to major industry players such as North Huachuang and TSMC [1] Group 3: Advancements in Third-Generation Semiconductors - The company has proactively positioned itself in the third-generation semiconductor field, reserving core technologies such as "rapid CVD-SiC technology" and "CVD-SiC grain control technology" [1] - The rapid CVD-SiC technology enables fast and uniform deposition of silicon carbide, while the grain control technology enhances coating fatigue resistance by adjusting process parameters [1] - These advancements lay a solid foundation for improving the domestic semiconductor supply chain [1]