Group 1 - The State Intellectual Property Office of China has granted a patent titled "Mask, Semiconductor Structure and Its Formation Method" to Semiconductor Manufacturing International Corporation (SMIC) in Shanghai and Beijing, with the application date being August 2020 [1] - SMIC (Shanghai) was established in 2000, has a registered capital of 244 million USD, and is primarily engaged in the manufacturing of computers, communications, and other electronic devices. The company has made investments in 4 enterprises and participated in 127 bidding projects, holding 150 trademark records and 5000 patent records [1] - SMIC (Beijing) was founded in 2002, has a registered capital of 100 million USD, and also focuses on the manufacturing of computers, communications, and other electronic devices. The company has invested in 1 enterprise, participated in 53 bidding projects, holds 5000 patent records, and has 225 administrative licenses [1]