Core Viewpoint - The article discusses the emergence of a new American startup, Substrate, which has developed a new lithography machine aimed at competing with ASML's advanced EUV lithography machines, potentially revolutionizing the semiconductor manufacturing landscape [1][3]. Group 1: Company Overview - Substrate is a new startup focused on developing advanced lithography technology to challenge the dominance of ASML in the semiconductor industry [3]. - The company aims to establish a wafer foundry business in the U.S. to compete with TSMC's position in the market [3]. Group 2: Technology and Cost Reduction - Substrate has created a lithography machine based on X-ray technology, utilizing particle accelerators to achieve shorter wavelengths, which significantly reduces production costs [3]. - The current cost of advanced EUV lithography machines is around $200 million for NA 0.33 and $400 million for the next-generation NA 0.55 machines, with a typical advanced fab investment reaching $15 billion [3]. - The new technology could potentially lower the production cost of advanced wafers from an estimated $100,000 to approximately $10,000 by 2028, making U.S. chip production competitive with Chinese manufacturing costs [3]. Group 3: Financial Aspects - Substrate has achieved a valuation of $1 billion and secured $100 million in funding from several U.S. venture capital firms, although it has not yet received government support [3].