Core Viewpoint - Fujifilm has successfully developed a new type of photoresist specifically for semiconductor manufacturing that does not contain controversial harmful substances, namely per- and polyfluoroalkyl substances (PFAS) [2] Group 1: Product Development - The newly developed fluorinated argon (ArF) immersion photoresist is suitable for negative ArF immersion lithography technology and can form metal wiring at the 28-nanometer level with high yield, targeting automotive and industrial semiconductor applications [2] - Fujifilm plans to accelerate the commercialization process based on customer evaluations [2] Group 2: Financial Performance - In the first quarter of 2025, Fujifilm's semiconductor materials sales reached 63.2 billion yen, representing a year-on-year growth of 3.2% compared to 2023 [3] Group 3: Market Overview - The global photoresist market is primarily dominated by manufacturers such as JSR, Tokyo Ohka, DuPont, Shin-Etsu Chemical, Sumitomo, and Fujifilm, with a higher market concentration in the high-end KrF and ArF sectors [6] - The semiconductor photoresist market in mainland China is projected to reach 4.985 billion yuan by 2025, driven by advancements in lithography process resolution [10]