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版图图形尺寸校准方法及系统
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中芯国际取得版图图形尺寸校准方法及系统、掩膜版、设备及存储介质专利
Sou Hu Cai Jing· 2025-12-03 05:56
Group 1 - The core point of the article is that Semiconductor Manufacturing International Corporation (SMIC) has obtained a patent for a method and system for "layout graphic size calibration, mask, equipment, and storage medium" with the announcement number CN 119493330 B, applied on August 2023 [1] Group 2 - SMIC was established in 2000 and is located in Shanghai, primarily engaged in the manufacturing of computers, communications, and other electronic devices [1] - The registered capital of SMIC is 244 million USD [1] - According to data analysis, SMIC has invested in 4 companies, participated in 127 bidding projects, has 150 trademark information entries, and holds 5000 patent information entries, along with 446 administrative licenses [1]
中芯国际取得版图图形尺寸校准方法及系统等相关技术专利
Sou Hu Cai Jing· 2025-12-02 04:49
Core Insights - Semiconductor Manufacturing International Corporation (SMIC) has obtained a patent for a method and system for "layout graphic size calibration, mask, equipment, and storage medium" with the authorization announcement number CN119493330B, applied on August 2023 [1] Company Overview - SMIC was established in 2000 and is located in Shanghai, primarily engaged in the manufacturing of computers, communications, and other electronic devices [1] - The company has a registered capital of 244 million USD [1] - SMIC has invested in 4 companies and participated in 127 bidding projects [1] - The company holds 150 trademark records and 5000 patent records, along with 446 administrative licenses [1]