Group 1 - The core viewpoint of the articles highlights the successful completion of several million yuan in Pre-A round financing for Jingdian Optoelectronics (Quanzhou) Semiconductor Equipment Co., Ltd, led by Qiancheng Capital with participation from Yuanhe Origin and Rongyue Investment [1] - Jingdian Optoelectronics is founded by He Wei, the CEO of a well-known domestic electron microscope company, and the core team has extensive experience in electron beam equipment research and development [1] - The company focuses on the independent research and production of advanced semiconductor equipment, particularly electron beam lithography machines, which are crucial for nanometer-level patterning in integrated circuit manufacturing [1] Group 2 - The investment teams from Qiancheng Capital and Yuanhe Origin emphasize the critical position of electron beam lithography equipment in the semiconductor industry, noting its high technical difficulty and urgent need for domestic production [2] - The teams believe that Jingdian Optoelectronics has a strong potential for breakthrough developments in this niche field, which will enhance the domestic semiconductor supply chain [2] - Rongyue Investment highlights that electron beam lithography (EBL) is a key technology for achieving processing precision at the nanoscale and atomic level, with increasing market demand as semiconductor technology approaches physical limits [2]

Core Viewpoint - Shanghai Jiao Tong University has announced procurement intentions for 12 types of scientific instruments and equipment, with a total budget of 106 million yuan, expected to be procured by October 2025 [2][3]. Procurement Overview - The procurement includes various advanced instruments such as electron beam lithography machines, ultra-low noise temperature control systems, ion beam etching equipment, vacuum multi-chamber magnetron sputtering systems, and wet dilution refrigerators [3][4]. - The total budget for these procurements is 106 million yuan, indicating significant investment in research and development capabilities [2][3]. Detailed Procurement List - **Electron Beam Lithography Machine**: 2 units, specifications include resolution ≤50 nm, acceleration voltage 1–100 kV, and spot size ≤16 nm, with a delivery period of 24 months from contract signing [4][5]. - **Ultra-Low Noise Temperature Control System**: 1 unit, with requirements such as equivalent noise density ≤5 nV/√Hz and a cooling power of ≥12 μW at 20 mK, also with a 24-month delivery period [4][5]. - **Ion Beam Etching Equipment**: 1 unit, specifications include ion energy 100–2000 eV and etching rate 1–100 nm/min, with a delivery period of 24 months [4][5]. - **Vacuum Multi-Chamber Magnetron Sputtering System**: 1 unit, requiring vacuum ≤6.7×10^-5 Pa and RF source power ≥500 W, with a 24-month delivery period [4][5]. - **Wet Dilution Refrigerator Scanning Probe Microscope System**: 1 unit, with a minimum temperature of ≤20 mK and a cooling power of 280 μW at 100 mK, also with a 24-month delivery period [6]. Additional Equipment Specifications - **Deep Silicon Etching Equipment**: 1 unit, with etching depth 10–500 µm and aspect ratio >20:1, delivery within 24 months [5]. - **Reactive Ion Etching Equipment**: 2 units, with specifications including working pressure 1 Pa to 10 Pa and etching resolution ≤50 nm, delivery within 24 months [5]. - **Laser Floating Zone Furnace**: 1 unit, with a laser power of 2KW and temperature >2500°C, delivery within 24 months [5]. - **Composite Coating System**: 1 unit, including electron beam evaporation and magnetron sputtering chambers, delivery within 24 months [5]. This procurement initiative reflects a strategic move by Shanghai Jiao Tong University to enhance its research infrastructure and capabilities in advanced materials and nanotechnology.