羲之号电子束光刻机

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绕开EUV卡脖子,中国首台电子束光刻机诞生,精度0.6nm!
Xin Lang Cai Jing· 2025-08-15 08:23
Core Insights - The emergence of China's first commercial electron beam lithography machine marks a significant advancement in quantum chip research, allowing for greater independence from foreign technology [1][4] - The new technology enables precise circuit patterning without the need for complex optical lenses or masks, showcasing Chinese innovation in the semiconductor industry [1][4] - China's ability to produce chips at 0.6 nanometers demonstrates its competitive edge over foreign counterparts, who are still focused on 1 nanometer technology [3] Group 1: Electron Beam Lithography Machine - The introduction of the "Xizhi" electron beam lithography machine allows for flexible and precise arrangement of quantum bits, overcoming previous limitations imposed by foreign equipment [4] - This technology is positioned as a new path for China, diverging from traditional methods and focusing on quantum and new material chips [4] - The machine's development reflects the dedication and effort of numerous researchers in China, emphasizing the country's capability to achieve top-tier technology [4] Group 2: Huawei's Chip Technology - Huawei's chip stitching technology allows multiple chips to work together, significantly enhancing data processing speeds and addressing performance limitations [3] - The technology enables the combination of lower-process chips to outperform leading foreign chips, such as those from NVIDIA, demonstrating China's innovative approach to chip performance [3] - This advancement challenges the perception of foreign dominance in high-end chip performance and showcases China's growing capabilities in the semiconductor sector [3]