Core Viewpoint - The company emphasizes the existing gaps in domestic high-purity quartz substrates for advanced photomasks, particularly in material purity, defect density, surface flatness, and thermal expansion coefficient stability, which directly affect photomask precision and yield [1] Group 1 - The main indicators of the gap in high-purity quartz substrates are material purity, defect density, surface flatness, and thermal expansion coefficient stability [1] - The root cause of these gaps lies in the accumulation of core technologies related to high-purity synthesis and ultra-precision processing [1] - The company supports breakthroughs in domestic high-end substrate technology and plans to actively and steadily promote the verification and introduction of qualified domestic substrates, provided that related products can continuously meet process stability and yield requirements [1]