Core Viewpoint - The establishment of testing standards for extreme ultraviolet (EUV) photoresists is crucial for the development of China's semiconductor industry, particularly as the country aims for self-sufficiency in advanced chip manufacturing [2][3]. Group 1: Standards and Testing Methods - The National Standardization Administration has announced three key standards related to photoresists, including methods for testing EUV photoresists, which are essential for semiconductor manufacturing at nodes of 3 nm and below [2][3]. - The EUV photoresist testing standard will systematically integrate material characteristics and performance parameters, focusing on critical performance indicators such as purity, etch resistance, line edge roughness, and sensitivity [3]. Group 2: Industry Implications - The development of these standards is significant as China's current domestic production rate of EUV photoresists is nearly zero, and the R&D efforts are still in the early stages [3]. - Establishing a unified testing methodology will not only fill the technical standard gap in the EUV photoresist field but also provide an objective benchmark for performance evaluation, promoting innovation in the domestic photoresist industry [3]. Group 3: Upcoming Events - TrendBank is organizing the 2025 Heterogeneous Integration Annual Conference from November 17-19, 2025, in Ningbo, focusing on advanced packaging technologies and fostering collaboration between industry and academia [4][5].