Group 1 - The core point of the article is that Shanghai Chip Micro-Assembly Technology Co., Ltd. has successfully developed and delivered its first 350nm stepper lithography machine (AST6200), marking a significant breakthrough in China's high-end semiconductor lithography equipment sector [1][3]. - The AST6200 lithography machine is designed based on years of expertise in optical system design, precision motion control, and semiconductor process understanding, aimed at advanced manufacturing scenarios such as power, RF, optoelectronics, and Micro LED [1]. - The delivery of the first AST6200 is seen as just the beginning, with the company planning to collaborate closely with upstream and downstream partners in the industry chain to accelerate the deployment and validation of domestic lithography equipment in more application scenarios [3].

Core Insights - Shanghai AMIES has successfully completed the factory debugging and acceptance of its first 350nm stepper lithography machine (AST6200), marking a significant breakthrough in China's high-end semiconductor lithography equipment sector [1][3] Group 1: Product Development - The AST6200 lithography machine is designed based on years of expertise in optical system design, precision motion control, and semiconductor process understanding, emphasizing high performance, reliability, and full autonomy [3] - The machine features high-resolution imaging capabilities, achieving 350nm resolution to meet the lithography process requirements of mainstream compound semiconductor chips [7] - It incorporates a high-precision alignment system for front and back alignment, ensuring precise multi-layer pattern alignment and improving device yield [7] Group 2: Cost Efficiency and Autonomy - The AST6200 is designed for high yield and significantly reduces the cost of ownership (COO) [7] - It is equipped with a fully autonomous software control system developed by AMIES, providing complete sovereignty from the ground up and offering strong process scalability and remote operation capabilities [7] Group 3: Technical Specifications - The machine utilizes a high-intensity I-line light source with a wavelength of 365nm, categorized as deep ultraviolet (UVA) [8] - It features a high-speed linear motor substrate transfer system that supports rapid switching between various substrate sizes (2/3/4/6/8 inches) [8] - The high-speed, high-precision motion stage system achieves a maximum acceleration of 1.5g, significantly enhancing throughput [8] Group 4: Versatility and Compatibility - The AST6200 supports multiple substrate materials including Si, SiC, InP, GaAs, and sapphire, and is compatible with various substrate types such as flat edge, double flat edge, and Notch [8] - It includes an innovative focus and leveling system that can accurately measure transparent, semi-transparent, opaque, and large-step substrates [8] - The machine also supports back alignment modules to meet the complex process requirements of bonded wafers [8]