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极紫外(EUV)光刻
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美国要发力EUV光刻
半导体芯闻· 2025-04-14 10:16
Core Viewpoint - The article discusses the transition of former Intel CEO Pat Gelsinger to xLight, a startup focused on revolutionizing EUV lithography technology through the use of particle accelerators, aiming to enhance semiconductor manufacturing efficiency and reduce costs significantly [1][5][6]. Group 1: Company Overview - xLight aims to commercialize Free Electron Lasers (FEL) powered by particle accelerators to produce EUV light, which is essential for advanced semiconductor manufacturing [4][6]. - The company claims its EUV light source will be four times more powerful than current technologies, potentially generating billions in additional annual revenue for semiconductor fabs [6][11]. Group 2: Technology and Innovation - Current EUV light generation methods, such as Laser Produced Plasma (LPP), are highly energy-intensive, producing only 500 watts of light from 1.5 megawatts of power [1][4]. - xLight's FEL technology is designed to be fully compatible with existing ASML tools, addressing the need for higher power sources (up to 2 kW) for future semiconductor manufacturing [4][5]. Group 3: Economic and Strategic Implications - The advancements in EUV technology are critical for maintaining the U.S.'s leadership in the semiconductor industry, which is vital for economic prosperity and national security [6][11]. - xLight's system is expected to reduce wafer costs by approximately 50% and lower capital and operational expenditures by over three times [6][11]. Group 4: Future Prospects - xLight is currently developing a fully functional prototype that will connect to ASML scanners and is expected to be operational by 2028 [6][8]. - The company believes its technology will not only enhance semiconductor applications but also address challenges in national security and biotechnology [7][8].
日本Rapidus4月试产2nm芯片!
国芯网· 2025-04-02 12:16
这家成立两年的公司正准备在2027年大规模生产采用2nm工艺的半导体,理论上,这将与台积电在芯片 制造能力方面相媲美。迄今为止,日本已拨出1.72万亿日元(115亿美元)来支持这家初创公司,以期 夺回被美国、中国台湾和韩国抢占的部分技术领导地位。日本还将向Rapidus提供高达8025亿日元(约 合54亿美元)的额外援助。 72岁的Rapidus CEO Atsuyoshi Koike表示:"开发2nm技术和大规模生产技术极其困难,未来还有更多的 实验。我们将一步一步降低错误率,赢得客户信任。" 不拘中国、 放眼世界 ! 关注 世界半导体论坛 ↓ ↓ ↓ 4月2日消息,日本晶圆代工创企Rapidus开始调试芯片制造设备,计划在4月底开始试产先进半导体,这 是其制造AI组件的关键一步。 Atsuyoshi Koike表示,Rapidus 4月1日已首次使用ASML设备进行极紫外(EUV)光刻。他说,第一批 测试芯片可能会在7月问世,该公司仍按计划在北海道北部岛屿的工厂大规模生产先进芯片。 国芯网[原:中国半导体论坛] 振兴国产半导体产业! 第二步:在公众号里面回复"加群",按照提示操作即可。 爆料|投稿|合作| ...