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又一家公司,想颠覆EUV光刻
半导体行业观察· 2025-05-28 01:36
Core Viewpoint - The article discusses the advancements and challenges in the semiconductor lithography industry, particularly focusing on EUV lithography and emerging technologies like Inversion Semiconductor's particle accelerator-based light source and Atum Works' 3D printing technology for chip manufacturing [1][2][14]. Group 1: EUV Lithography and Inversion Semiconductor - ASML's EUV lithography machines are essential for modern chip production, especially as processes advance to 3nm technology [1]. - The importance of EUV lithography is increasing, with ASML leading the transition to High NA EUV to meet stricter customer demands [1]. - Inversion Semiconductor aims to utilize a "desktop" particle accelerator to produce high-power light, significantly reducing the size of traditional accelerators from kilometers to about one meter [3][4]. - The company plans to achieve a light source output power of 10 kilowatts, which could generate billions in annual revenue for wafer fabs [2][6]. Group 2: Laser Wakefield Acceleration (LWFA) - Inversion Semiconductor's technology leverages Laser Wakefield Acceleration (LWFA) to accelerate electrons to high energies over short distances, enhancing the efficiency of light generation [3][4]. - The collaboration with Lawrence Berkeley National Laboratory aims to develop a high-power, tunable light source named STARLIGHT, targeting soft X-rays in the range of 20nm to 6nm [6][7]. - The anticipated improvements include doubling transistor density and tripling throughput compared to existing machines, potentially allowing a single light source to power multiple lithography machines [7][8]. Group 3: Alternative Lithography Technologies - Lace Lithography AS is exploring atom-based lithography, claiming it can achieve resolutions beyond the limits of current EUV technology, offering a cost-effective and energy-efficient alternative [8][9]. - The company is developing a prototype that utilizes metastable atoms and dispersion force-based masks to achieve 2nm feature sizes, currently in the concept validation stage [9][10]. - Atum Works is promoting its nano-scale 3D printing technology, which could reduce chip manufacturing costs by up to 90%, although it currently lags behind mainstream logic chip technology by about 20 years [14][15]. Group 4: Future Prospects and Industry Impact - The semiconductor industry is facing fundamental bottlenecks in 2D lithography, prompting a shift towards 3D integration to accommodate more transistors and bandwidth on chips [14][15]. - Atum Works' 3D printing technology aims to simplify the manufacturing process by enabling direct material deposition in three-dimensional space, potentially improving yield and efficiency [15][16]. - The advancements in lithography technologies, including both EUV and emerging alternatives, indicate a dynamic landscape in semiconductor manufacturing, with significant implications for future chip design and production [16].