Core Viewpoint - The 9th International Advanced Lithography Technology Symposium (IWAPS) will be held on October 14-15, 2025, in Shenzhen, aiming to create a global platform for communication and collaboration in the lithography technology field [4]. Group 1: Event Overview - The symposium is organized by the China Integrated Circuit Innovation Alliance and the Chinese Optical Society, with support from various institutions, including the Chinese Academy of Sciences and the Shenzhen Semiconductor and Integrated Circuit Industry Alliance [4]. - IWAPS aims to build a dialogue platform covering the entire lithography industry chain, including equipment, process technology, metrology, mask materials, computational lithography, and new technologies [4]. Group 2: Participation and Submission - Papers submitted to the symposium will be reviewed for inclusion in the SPIE Digital Library and EI [8][12]. - The abstract submission deadline is July 31, 2025, and the full paper submission deadline is September 30, 2025 [11][12]. - Authors are encouraged to submit abstracts that clearly describe the nature, research topics, and significance of their work, with a maximum of 500 words [11]. Group 3: Historical Context - IWAPS has been held annually since its inception, with previous events taking place in various cities, including Beijing, Xiamen, Nanjing, Chengdu, and Lishui [13][20][21][29]. - The symposium has successfully facilitated discussions and advancements in lithography technology over the years, contributing to the growth of the industry [36].